Closing the design-to-manufacturing gap for optical devices

Photolithography is a technique for precisely etching features onto a surface by manipulating light. It is typically used to make computer chips and optical devices like lenses. Yet, minuscule deviations during the assembling system frequently make these gadgets miss the mark regarding their fashioners’ goals.

A digital simulator that imitates a specific photolithography manufacturing process was developed by researchers from MIT and the Chinese University of Hong Kong using machine learning to help close this design-to-manufacturing gap. In order to accurately model how the photolithography system would fabricate a design, their method makes use of actual data gathered from the system.

The specialists coordinate this test system into a plan structure, alongside one more computerized test system that imitates the exhibition of the created gadget in downstream undertakings, for example, delivering pictures with computational cameras. A user can create an optical device that is more in line with its design and performs at its best with these connected simulators.